MBE-Grown Lead Tin Telluride Infrared Devices

Authors

  • T. Srinivasan Indian Institute of Technology, Madras-400 036
  • J. Sobhanadri Indian Institute of Technology, Madras-400 036

DOI:

https://doi.org/10.14429/dsj.39.4748

Keywords:

Molecular Beam Epitaxy, Fabricated band pass filters

Abstract

An attempt was made to examine the performance of the Pb0.82sn0.18Te films grown by Molecular Beam Epitaxy (MBE)technique as infrared (IR) band pass filter and photoconductive IR detector. Films of required thickness for these purposes were precalculated and were grown by controlling the growth time. The fabricated band-pass filters were with Full Width at Half Maximum(FWHM) of 20-25 per ent centred at 6.5, 8 and 10 microns. The measured detectivity of the film was of the order of 10 power 8 cm H Z (1/2)W(-1) for 500 K black body temperature with 800 Hz chopping frequencyand 10 per cent electrical bandwidth at 77 K. All these films weregrown on freshly cleaved KC1 (100) substrates.

References

Einspruch, N.G.. VLSI Electronics and Micro Structure Science, Vol 5 (Academic Press, New York), 1982, p. 229.

Srinivasan, T., Thesis (IIT, Madras), 1988.

Srinivasan, T.. Vaya, P.R. & Sobhanadri, J., Thin Solid Films, 161 (1988):428.

Srinivasan, T., Vaya, P.R. & Sobhanadri, J., 7th Int. Conf. Thin Films (New Delhi, India), 1987. MBE-Grown Lead Tin Telluride Infrared Devices

Srinivasan, T., Vaya, P.R. & Sobhanadri, J., 4th Int. Conf. Solid Films and Surfases, (Hamamastsu, Japan), 1987.

Srinivasan, T. & Sobhanadri, J . , Semicon. Sci. Technol., 3 (1988), 494.

Long, D., Topics in Applied Physics, 19 (1980), 101.

Kruse, P.W., Mc Gauchin, L.D. & Mc Quistan, R.B., Elements of Infrared

Technology, (Wiley, New York), 1962

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Published

2013-01-01

How to Cite

Srinivasan, T., & Sobhanadri, J. (2013). MBE-Grown Lead Tin Telluride Infrared Devices. Defence Science Journal, 39(1), 43–51. https://doi.org/10.14429/dsj.39.4748

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Section

General Papers

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