Nano Pattern Formation and Surface Modifications by Ion Irradiation

Authors

  • Dipak Paramanik Institute of Physics, Bhubaneswar
  • Subrata Majumder Institute of Physics, Bhubaneswar
  • S. R. Sahoo Institute of Physics, Bhubaneswar
  • Shikha Varma Institute of Physics, Bhubaneswar-751 005

DOI:

https://doi.org/10.14429/dsj.59.1541

Keywords:

InP, AFM, ion irradiation, nanotechnology, semiconductor nanostructures, fabrication

Abstract

Ion Irradiation is a technologically important technique to modify the surfaces. We have investigated the patterning of InP(111) surfaces by low energy (3 keV) as well as high energy (1.5 Mev) ion beams. After low energy ion irradiation, surfaces exhibit well defined nano dots which ripen at initial stages but exhibit fragmentations at high fluences. The surface rms, at both the energies, displays a similar behaviour of initially increasing with increasing fluences but decreasing for higher fluences. The studies show some common features at these low and high energies, like the smoothening of surface beyond the a/c transition.
Defence Science Journal, 2009, 59(4), pp.413-426, DOI:http://dx.doi.org/10.14429/dsj.59.1541

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Published

2009-07-01

How to Cite

Paramanik, D., Majumder, S., Sahoo, S. R., & Varma, S. (2009). Nano Pattern Formation and Surface Modifications by Ion Irradiation. Defence Science Journal, 59(4), 413–426. https://doi.org/10.14429/dsj.59.1541

Issue

Vol. 59 No. 4: Ion Beam Technology

Section

Special Issue Papers

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