KUMAR, S.; MALIK, A.; RAWAL, D. S.; VINAYAK, S.; MALIK, H. Performance Analysis of GaN/AlGaN HEMTs Passivation using Inductively Coupled Plasma Chemical Vapour Deposition and Plasma Enhanced Chemical Vapour Deposition Techniques. Defence Science Journal, [S. l.], v. 68, n. 6, p. 572–576, 2018. DOI: 10.14429/dsj.68.12329. Disponível em: https://publications.drdo.gov.in/ojs/index.php/dsj/article/view/12329. Acesso em: 14 jun. 2025.