NAMBISSAN, P. Characterisation of Ion Implantation-induced Defects in Certain Technologically Important Materials by Positron Annihilation (Review Paper). Defence Science Journal, [S. l.], v. 59, n. 4, p. 329–341, 2009. DOI: 10.14429/dsj.59.1531. Disponível em: https://publications.drdo.gov.in/ojs/index.php/dsj/article/view/1531. Acesso em: 15 jun. 2025.